A precision pattern providing accurate calibration in the horizontal plane for very high resolution, nanometer-scale measurements. Period: 70 nm pitch, one-dimensional array. Accurate to +/- 0.25 nm. Refer to calibration certificate for actual pitch. Surface: Silicon Oxide ridges on Silicon, 4x3 mm die. Ridge height (about 35 nm) and width (about 35 nm) are not calibrated. For AFM, use in contact, intermittent contact (TappingMode) and other modes with image sizes from 100 to 3000 nm.